3.00 Credits
Methods, techniques, and computer algorithms for planning facility layout, facility location, and activities and equipment planning are presented. Scheduling strategies that affect facility layout including push vs. pull operation, batch sizes, and dispatching rules are also discussed. Cellular technology, material handling, facility planning data collection methods, process flow-charting, and simulation of manufacturing facility layout are demonstrated. Fall semester. Lecture 3 hours. Prerequisite: ENIE 3540 or ETEM 3540 with a minimum grade of C or department head approval. May be registered as ETEM 4580. Credit not allowed in both ENIE 4580 and ETEM 4580. Laboratory/studio course fee will be assessed. Supplementary course fee assessed.